Deep plasma etching of glass for fluidic devices with different mask materials

Deep reactive ion etching (DRIE) processes have been developed for fabricating fluidic devices in glass (Pyrex™ and fused silica) substrates with cavities deeper than 100 µm. By using a standard silicon wafer as the etch mask, patterned by silicon DRIE, very deep and nearly vertical structures can be etched into the glass. In this work, an atmospheric pressure chemical ionization chip was fabricated. Also the results show potential for satisfactory etch characteristics with Ni, amorphous silicon (a-Si) and SU-8 as mask materials.

[1]  M. Gijs,et al.  Powder blasting for three-dimensional microstructuring of glass , 2000 .

[2]  P. Leech.  Reactive ion etching of quartz and silica-based glasses in CF4/CHF3 plasmas , 1999 .

[3]  R. Kostiainen,et al.  Glass microfabricated nebulizer chip for mass spectrometry. , 2007, Lab on a chip.

[4]  Plasma applications for biochip technology , 2003 .

[5]  P. Revell,et al.  A review of reactive ion beam etching for production , 1984 .

[6]  M. Barela,et al.  Effects of Ar and O2 additives on SiO2 etching in C4F8-based plasmas , 2003 .

[7]  A. Evans,et al.  A new masking technology for deep glass etching and its microfluidic application , 2004 .

[8]  W. Jang,et al.  Institute of Physics Publishing Journal of Micromechanics and Microengineering Fabrication of Mems Devices by Using Anhydrous Hf Gas-phase Etching with Alcoholic Vapor , 2022 .

[9]  T. Akashi,et al.  Deep reactive ion etching of borosilicate glass using an anodically bonded silicon wafer as an etching mask , 2006 .

[10]  N. Lee,et al.  Deep dry etching of borosilicate glass using SF6 and SF6/Ar inductively coupled plasmas , 2005 .

[11]  H. Gamble,et al.  Characterization of masking materials for deep glass micromachining , 2003 .

[12]  Klavs F. Jensen,et al.  Isotropic etching of silicon in fluorine gas for MEMS micromachining , 2007 .

[13]  P. J. M. Burgt,et al.  Metastable fragment production by electron-impact dissociation of CF4 , 1991 .

[14]  R. Lehtiniemi,et al.  A Microfabricated Nebulizer for Liquid Vaporization in Chemical Analysis , 2006, Journal of Microelectromechanical Systems.

[15]  Kai Kolari,et al.  Deep plasma etching of glass with a silicon shadow mask , 2008 .

[16]  Masayoshi Esashi,et al.  Fabrication of high-density electrical feed-throughs by deep-reactive-ion etching of Pyrex glass , 2002 .

[17]  W. Cho,et al.  Micro-grooving of glass using micro-abrasive jet machining , 2004 .

[18]  Ralph Greif,et al.  Energy deposition and shock wave propagation during pulsed laser ablation in fused silica cavities , 2004 .

[19]  S. Franssila.  Introduction to microfabrication , 2004 .

[20]  Aiko Narazaki,et al.  Laser ablation of toluene liquid for surface micro-structuring of silica glass , 2006 .