论文信息 - Synthesis and properties of TiO2 thin films by plasma source ion implantation - 字舞流文

Synthesis and properties of TiO2 thin films by plasma source ion implantation

K. Baba | R. Hatada

[1] Y. H. Lee. A role of energetic ions in RF-biased PECVD of TiO2 , 1998 .

[2] K. Niihara,et al. Roles of polyethylene glycol in evolution of nanostructure in TiO2 coatings , 1997 .

[3] K. No,et al. Effects of process parameters on titanium dioxide thin film deposited using ECR MOCVD , 1996 .

[4] S. Komarneni,et al. Sol–Gel Fabrication of Epitaxial and Oriented TiO2 Thin Films , 1992 .

[5] J. R. Conrad,et al. Plasma source ion-implantation technique for surface modification of materials , 1987 .

[6] J. Conrad. Sheath thickness and potential profiles of ion‐matrix sheaths for cylindrical and spherical electrodes , 1987 .