Diffuse scattering of lamellar optical gratings due to line edge roughness
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Dirk Michaelis | Uwe D. Zeitner | Thomas Flügel-Paul | Martin Heusinger | Michael Banasch | D. Michaelis | U. Zeitner | M. Heusinger | T. Flügel-Paul | M. Banasch
[1] Chris A. Mack. Line-edge roughness and the ultimate limits of lithography , 2010, Advanced Lithography.
[2] Joerg Bischoff,et al. Scatterometry modeling for gratings with roughness and irregularities , 2016, SPIE Advanced Lithography.
[3] Uwe D. Zeitner,et al. High-performance dielectric diffraction gratings for space applications , 2012, Other Conferences.
[4] Stefan Kraft,et al. Fluorescence imaging spectrometer concepts for the Earth explorer mission candidate flex , 2017, International Conference on Space Optics.
[5] Cornelis W. Hagen,et al. Determination of line edge roughness in low-dose top-down scanning electron microscopy images , 2014 .
[6] E. Gogolides,et al. A review of line edge roughness and surface nanotexture resulting from patterning processes , 2006 .
[7] D. Michaelis,et al. Diffuse scattering due to stochastic disturbances of 1D-gratings on the example of line edge roughness. , 2018, Optics express.
[8] B. Shore,et al. High-efficiency fused-silica transmission gratings. , 1997, Optics letters.
[9] Tina Clausnitzer,et al. Highly efficient polarization-independent transmission gratings for pulse stretching and compression , 2004, SPIE Optical Systems Design.
[10] T. Gaylord,et al. Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings , 1995 .
[11] Thomas Herbert Naylor. Computer Simulation Techniques , 1966 .
[12] Chris A. Mack. A Simple Model of Line-Edge Roughness , 2010 .
[13] M. Al-Kuhaili,et al. Optical properties of chromium oxide thin films deposited by electron-beam evaporation , 2007 .
[14] Martin Heusinger,et al. Rowland ghost suppression in high efficiency spectrometer gratings fabricated by e-beam lithography. , 2017, Optics express.
[15] H. Gross,et al. Impact of different stochastic line edge roughness patterns on measurements in scatterometry - A simulation study , 2017 .
[16] Z. T. Khodair,et al. Studying the optical properties of ( Cr2O3:I ) thin films prepared by spray pyrolysis technique , 2012 .
[17] R. W. Christy,et al. Optical constants of transition metals: Ti, V, Cr, Mn, Fe, Co, Ni, and Pd , 1974 .
[18] F. Lévy,et al. Characterization of sputter-deposited chromium oxide thin films , 1999 .
[19] J.-L. Bézy,et al. FIMAS: feasibility study of a fluorescence imaging spectrometer to be flown on a small platform in tandem with Sentinel 3 , 2017, International Conference on Space Optics.
[20] Thomas A. Germer,et al. Modeling the effect of line profile variation on optical critical dimension metrology , 2007, SPIE Advanced Lithography.
[21] E. Kley,et al. High performance diffraction gratings made by e-beam lithography , 2011 .
[22] E. Hannan,et al. The Statistical Theory of Linear Systems. , 1990 .
[23] Angeliki Tserepi,et al. Quantification of line-edge roughness of photoresists. II. Scaling and fractal analysis and the best roughness descriptors , 2003 .
[24] Frank Scholze,et al. Effect of line roughness on the diffraction intensities in angular resolved scatterometry , 2010 .
[25] Thomas J Suleski,et al. Effective medium approximations for modeling optical reflectance from gratings with rough edges. , 2010, Journal of the Optical Society of America. A, Optics, image science, and vision.
[26] J. E. Harvey,et al. Modeling of light scattering in different regimes of surface roughness. , 2011, Optics express.
[27] Chris A. Mack. Analytical expression for impact of linewidth roughness on critical dimension uniformity , 2014 .