Optical critical dimension measurement and illumination analysis using the through-focus focus metric
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[1] Bryan M. Barnes,et al. The Limits of Image-Based Optical Metrology | NIST , 2006 .
[2] Egon Marx,et al. Simulations of optical microscope images , 2006, SPIE Advanced Lithography.
[3] Egon Marx,et al. Calibration strategies for overlay and registration metrology , 2003, SPIE Advanced Lithography.
[4] Mark P. Davidson. Analytic waveguide solutions and the coherence probe microscope , 1991 .
[5] Yi-Sha Ku,et al. Through-focus technique for nano-scale grating pitch and linewidth analysis. , 2005, Optics express.
[6] Richard M. Silver,et al. Köhler illumination for high-resolution optical metrology , 2006, SPIE Advanced Lithography.
[7] Richard M. Silver,et al. Application of through-focus focus-metric analysis in high resolution optical metrology , 2005, SPIE Advanced Lithography.
[8] E. Marx,et al. High-resolution optical metrology , 2005, SPIE Advanced Lithography.
[9] Egon Marx,et al. Evaluation of new in-chip and arrayed line overlay target designs , 2004, SPIE Advanced Lithography.