Thermal conductivity and diffusivity of free‐standing silicon nitride thin films
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[1] T. Klitsner,et al. Thermal conductivity of thin films: Measurements and understanding , 1989 .
[2] F. Brotzen,et al. Thermal conductivity of thin SiO2 films , 1992 .
[3] K. Saraswat,et al. Low-temperature direct nitridation of silicon in nitrogen plasma generated by microwave discharge , 1985 .
[4] M. Maeda,et al. Insulation degradation and anomalous etching phenomena in silicon nitride films prepared by plasma-enhanced deposition , 1984 .
[5] M. Modest,et al. Measurement of spectral, directional reflectivities of solids at high temperatures between 9 and µm. , 1993, Applied optics.
[6] A. J. Lowe,et al. The electronic properties of plasma‐deposited films of hydrogenated amorphous SiNx (0 , 1986 .
[7] I. Hatta,et al. Thermal diffusivity measurement of thin films by means of an ac calorimetric method , 1985 .
[8] A. Tam,et al. Thermal diffusivity in thin films measured by noncontact single-ended pulsed-laser-induced thermal radiometry. , 1983, Optics letters.
[9] Roger T. Howe,et al. Microtransport induced by ultrasonic Lamb waves , 1991 .
[10] S. Ren,et al. Electronic structures of - and a-silicon nitride , 1981 .
[11] J. C. Li,et al. Thermal conductivity and interface thermal resistance of Si film on Si substrate determined by photothermal displacement interferometry , 1992 .
[12] Zou Shichang,et al. Optical properties and microstructure of silicon nitride film synthesized by ion beam enhanced deposition , 1989 .
[13] Richard M. White,et al. A multisensor employing an ultrasonic Lamb-wave oscillator , 1988 .
[14] Yu-Chong Tai,et al. Thermal conductivity of heavily doped low‐pressure chemical vapor deposited polycrystalline silicon films , 1988 .
[15] E. Paloura,et al. Silicon nitride films grown on silicon below 300 °C in low power nitrogen plasma , 1986 .
[16] Katherine L. Saenger,et al. An interferometric calorimeter for thin-film thermal diffusivity measurements , 1989 .