Bulk micromachining of silicon in TMAH-based etchants for aluminum passivation and smooth surface
暂无分享,去创建一个
S. Das | S. Kal | K. Biswas | S. K. Lahiri | D. K. Maurya | S. Lahiri | D. Maurya | K. Biswas | S. Kal | Soumen K. Das
[1] K.E. Petersen,et al. Silicon as a mechanical material , 1982, Proceedings of the IEEE.
[2] A. Reisman,et al. The Controlled Etching of Silicon in Catalyzed Ethylenediamine‐Pyrocatechol‐Water Solutions , 1979 .
[3] A. Faes,et al. Microstructures etched in doped TMAH solutions , 2000 .
[4] A. Heuberger,et al. Anisotropic Etching of Crystalline Silicon in Alkaline Solutions II . Influence of Dopants , 1990 .
[5] Soumen Das,et al. An analytical model of a silicon MEMS vaporizing liquid microthruster and some experimental studies , 2005 .
[6] Peter J. Hesketh,et al. Anisotropic Etching of Silicon in Rubidium Hydroxide , 1994 .
[7] Chengkuo Lee,et al. Investigation of TMAH for front-side bulk micromachining process from manufacturing aspect , 2001 .
[8] Frank A Chambers,et al. Cesium hydroxide etching of (100) silicon (for optical fiber attachment) , 1993 .
[9] John T. L. Thong,et al. TMAH etching of silicon and the interaction of etching parameters , 1997 .
[10] Philippe Allongue,et al. Etching of Silicon in NaOH Solutions II . Electrochemical Studies of n‐Si(111) and (100) and Mechanism of the Dissolution , 1993 .
[11] W. Benecke,et al. NH4Oh-based etchants for silicon micromachining , 1990 .
[12] Philippe Allongue,et al. Etching of silicon in NaOH solutions. I: In-situ STM investigation of n-Si(111) , 1993 .
[13] S. K. Lahiri,et al. Silicon MEMS vaporizing liquid microthruster with internal microheater , 2005 .
[14] A. Heuberger,et al. Anisotropic Etching of Crystalline Silicon in Alkaline Solutions I . Orientation Dependence and Behavior of Passivation Layers , 1990 .
[15] Pasqualina M. Sarro,et al. Effect of surfactant on surface quality of silicon microstructures etched in saturated TMAHW solutions , 2000 .
[16] O. J. Glembocki,et al. Hydration Model for the Molarity Dependence of the Etch Rate of Si in Aqueous Alkali Hydroxides , 1991 .
[17] M. Mehregany,et al. Anisotropic etching of silicon in hydrazine , 1988 .
[18] I-Ming Hsing,et al. An improved TMAH Si-etching solution without attacking exposed aluminum , 2000 .
[19] Osamu Tabata. pH-controlled TMAH etchants for silicon micromachining , 1996 .
[20] Norio Fujitsuka,et al. Silicon anisotropic etching without attacking aluminum with Si and oxidizing agent dissolved in TMAH solution , 2004 .
[21] O. Tabata,et al. Anisotropic etching of silicon in TMAH solutions , 1992 .
[22] Minking K. Chyu,et al. The characteristic behavior of TMAH water solution for anisotropic etching on both Silicon substrate and SiO2 layer , 2001 .
[23] Yasuroh Iriye,et al. Anisotropic etching rates of single-crystal silicon for TMAH water solution as a function of crystallographic orientation , 1999 .