Vertical MoS2 Double-Layer Memristor with Electrochemical Metallization as an Atomic-Scale Synapse with Switching Thresholds Approaching 100 mV.
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D. Ham | Yeonchoo Cho | Hyeon-Jin Shin | Seongjun Park | Min-Hyun Lee | Renjing Xu | Hae-ryong Kim | D. Amanov | Houk Jang | Haeryong Kim