Blazed, grazing incidence x-ray reflection gratings are an important component of modern high resolution spectrometers and related x-ray optics. These have traditionally been fabricated by diamond scribing in a ruling engine, or more recently by interferometric lithography followed by ion etching. These traditional methods result in gratings which suffer from a number of deficiencies, including high surface roughness and poor control of the groove profile. These deficiencies lead to poor diffraction efficiency and high levels of scattered light. We have developed a novel fabrication method for fabricating blazed x-ray reflection gratings which utilizes silicon wafers that are cut 0.7° off of the (111) plane. In solutions such as potassium hydroxide (KOH), silicon is etched in 〈111〉 directions orders of magnitude slower than in other directions, resulting in extremely smooth {111} facets. The gratings are patterned using interferometric lithography with 351.1 nm wavelength and transferred into the substrat...