A physics-based statistical model for reliability of STT-MRAM considering oxide variability

A physics-based statistical model considering oxide thickness (Tox) variability is proposed for evaluating the impact of time-dependent dielectric breakdown (TDDB) on the performance of spin-transfer torque magneto-resistive random access memory (STT-MRAM). The statistics of breakdown events are captured by the percolation theory, physics-based analytical model for successive break down (BD) and 1-D non-equilibrium Green's function (NEGF). Using the proposed model, we examine Tox-dependence of STT-MRAM performance distribution, such as tunneling magneto-resistance ratio (TMR) and critical current (IC). Simulation results clearly show that oxide variability needs to be taken into account for better lifetime prediction. The proposed model has been validated with experimental data.

[1]  Georgios D. Panagopoulos On variability and reliability of CMOS and spin-based devices , 2012 .

[2]  Yoshihiro Sugiyama,et al.  A study of dielectric breakdown mechanism in CoFeB/MgO/CoFeB magnetic tunnel junction , 2009, 2009 IEEE International Reliability Physics Symposium.

[3]  Luan Tran,et al.  45nm low power CMOS logic compatible embedded STT MRAM utilizing a reverse-connection 1T/1MTJ cell , 2009, 2009 IEEE International Electron Devices Meeting (IEDM).

[4]  R. Pierret,et al.  Advanced semiconductor fundamentals , 1987 .

[5]  M. Katoozi,et al.  A compact SPICE model for statistical post-breakdown gate current increase due to TDDB , 2013, 2013 IEEE International Reliability Physics Symposium (IRPS).

[6]  Mircea R. Stan,et al.  Self consistent parameterized physical MTJ compact model for STT-RAM , 2010, CAS 2010 Proceedings (International Semiconductor Conference).

[7]  Farbod Ebrahimi,et al.  SPICE Macromodel of Spin-Torque-Transfer-Operated Magnetic Tunnel Junctions , 2010, IEEE Transactions on Electron Devices.

[8]  Guido Groeseneken,et al.  New insights in the relation between electron trap generation and the statistical properties of oxide breakdown , 1998 .

[9]  V. Javerliac,et al.  SPICE modelling of magnetic tunnel junctions written by spin-transfer torque , 2010 .

[10]  S. Yuasa,et al.  Giant Tunnel Magnetoresistance in Magnetic Tunnel Junctions with a Crystalline MgO(0 0 1) Barrier , 2009 .

[11]  Kaushik Roy,et al.  A physical model to predict STT-MRAM performance degradation induced by TDDB , 2013, 71st Device Research Conference.

[12]  K. Roy,et al.  Modeling of dielectric breakdown-induced time-dependent STT-MRAM performance degradation , 2011, 69th Device Research Conference.

[13]  J. Sune,et al.  Statistics of successive breakdown events in gate oxides , 2003, IEEE Electron Device Letters.

[14]  J. Stathis Percolation models for gate oxide breakdown , 1999 .

[15]  K. Roy,et al.  Numerical analysis of typical STT-MTJ stacks for 1T-1R memory arrays , 2010, 2010 International Electron Devices Meeting.

[16]  S. Datta Quantum Transport: Atom to Transistor , 2004 .