Gate oxide reliability projection to the sub-2 nm regime
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J. Bude | P. Diodato | A. Ghetti | M. Alam | B. Weir | P. Silverman | Y. Ma | D. Hwang | F. Baumann | D. Monroe | T. Sorsch | G. Timp | M. M. Brown | A. Hamad | P. Mason | M. A. Alam | Yi Ma | M. M. Brown
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