Wetting and dissolution studies of fluoropolymers used in 157 nm photolithography applications
暂无分享,去创建一个
Zarka Zarkov | Thomas John Markley | Christopher K. Ober | John Anthony Marsella | Eric Anthony Robertson | G. E. Parris | Vladimir Jakubek
[1] Roderick R. Kunz,et al. Outlook for 157-nm Resist Designs , 1999 .
[2] William D. Hinsberg,et al. Measurement of Thin‐Film Dissolution Kinetics Using a Quartz Crystal Microbalance , 1986 .
[3] H. Koerner,et al. Tailoring Transparency of Imageable Fluoropolymers at 157 nm by Incorporation of Hexafluoroisopropyl Alcohol to Photoresist Backbones , 2002 .
[4] Georg Pawlowski,et al. Hexafluoroacetone in resist chemistry: a versatile new concept for materials for deep-UV lithography , 1992, Advanced Lithography.
[5] Will Conley,et al. 157 nm resist materials: Progress report , 2000 .
[6] Will Conley,et al. Metal-Catalyzed Vinyl Addition Polymers for 157 nm Resist Applications. 2. Fluorinated Norbornenes: Synthesis, Polymerization, and Initial Imaging Results , 2002 .
[7] Will Conley,et al. Highly transparent resist platforms for 157-nm microlithography: an update , 2002, SPIE Advanced Lithography.
[8] Eric L. Alemy,et al. Materials and Resists for 193 and 157nm Applications , 2001 .
[9] William P. Jencks,et al. General base catalysis, structure-reactivity interactions, and merging of mechanisms for elimination reactions of (2-arylethyl)quinuclidinium ions , 1982 .
[10] W. A. Zisman,et al. Relation of the Equilibrium Contact Angle to Liquid and Solid Constitution , 1964 .
[11] Roderick R. Kunz,et al. Outlook for 157 nm resist design , 1999 .
[12] Joice P. Mathew,et al. (η3-Allyl)palladium(II) and Palladium(II) Nitrile Catalysts for the Addition Polymerization of Norbornene Derivatives with Functional Groups , 1996 .
[13] R. D. Allen,et al. Development of 157 nm positive resists , 2001 .