Gate oxide scaling limits and projection
暂无分享,去创建一个
[1] Chenming Hu,et al. Temperature acceleration of time-dependent dielectric breakdown , 1989 .
[2] C. Hu,et al. Projecting gate oxide reliability and optimizing reliability screens , 1990 .
[3] K. Noguchi,et al. Modeling oxide thickness dependence of charging damage by plasma processing , 1993, IEEE Electron Device Letters.
[4] C. Hu,et al. Threshold voltage model for deep-submicrometer MOSFETs , 1993 .
[5] Chenming Hu,et al. Reliability of thin SiO2 , 1994 .
[6] Chenming Hu,et al. The impact of device scaling and power supply change on CMOS gate performance , 1996, IEEE Electron Device Letters.