Modeling of Lateral Migration Mechanism During the Retention Operation in 3D NAND Flash Memories

In this paper, we analyzed lateral migration mechanism during the retention operation in 3-D NAND flash memories. Retention characteristics for different trap energy levels $(E_{t})$ of charge trap layer were investigated through Technology computer-aided design (TCAD) simulation and modeled through stretched exponential function. In addition, time-constant $(\tau)$ at various temperatures were extracted through the modeled equation. Finally, the activation energy $(E_{a})$ of lateral migration mechanism was extracted by adopting the Arrhenius relationship.