Ecofriendly antiglare film derived from biomass using ultraviolet curing nanoimprint lithography for high-definition display

Abstract. Nanopatterning of an ecofriendly antiglare film derived from biomass using an ultraviolet curing nanoimprint lithography is reported. Developed sugar-related organic compounds with liquid glucose and trehalose derivatives derived from biomass produced high-quality imprint images of pillar patterns with a 230-nm diameter. Ecofriendly antiglare film with liquid glucose and trehalose derivatives derived from biomass was indicated to achieve the real refraction index of 1.45 to 1.53 at 350 to 800 nm, low imaginary refractive index of <0.005 and low volumetric shrinkage of 4.8% during ultraviolet irradiation. A distinctive bulky glucose structure in glucose and trehalose derivatives was considered to be effective for minimizing the volumetric shrinkage of resist film during ultraviolet irradiation, in addition to suitable optical properties for high-definition display.

[1]  Douglas J. Resnick,et al.  High-resolution defect inspection of step-and-flash imprint lithography for 32-nm half-pitch patterning , 2009, Advanced Lithography.

[2]  Ryan Deschner,et al.  Silicon-Containing Spin-on Underlayer Material for Step and Flash Nanoimprint Lithography , 2010 .

[3]  C. Grant Willson,et al.  Development of novel UV cross-linkable materials for enhancing planarity in via applications via the correlation of simulated and experimental analyses , 2009, Advanced Lithography.

[4]  Yves Leterrier,et al.  UV-nanoimprint lithography and large area roll-to-roll texturization with hyperbranched polymer nanocomposites for light-trapping applications , 2012 .

[5]  S. Chou,et al.  Integration of Metallic Nanostructures in Fluidic Channels for Fluorescence and Raman Enhancement by Nanoimprint Lithography and Lift-off on Compositional Resist Stack. , 2012, Microelectronic engineering.

[6]  Atsushi Sekiguchi,et al.  Nanoimprint Resist Material Containing Ultraviolet Reactive Fluorine Surfactant for Defect Reduction in Lithographic Fabrication , 2012 .

[7]  Satoshi Takei.  Plant-based resist materials for ultraviolet curing nanoimprint lithography , 2010 .

[8]  Frederick M. Fowkes,et al.  ADDITIVITY OF INTERMOLECULAR FORCES AT INTERFACES. I. DETERMINATION OF THE CONTRIBUTION TO SURFACE AND INTERFACIAL TENSIONS OF DISPERSION FORCES IN VARIOUS LIQUIDS1 , 1963 .

[9]  Makoto Muramatsu,et al.  Advanced ultraviolet cross-link process and materials for global planarization , 2008 .

[10]  Jie Yin,et al.  A “thiol-ene” photo-curable hybrid fluorinated resist for the high-performance replica mold of nanoimprint lithography (NIL) , 2012 .

[11]  L. Cheng,et al.  Preparation of polymer/silica composite antiglare coatings on poly(ethylene terphathalate) (PET) substrates , 2012, Journal of Coatings Technology and Research.

[12]  Takahiro Kozawa,et al.  Electron Beam Lithography Using Highly Sensitive Negative Type of Plant-Based Resist Material Derived from Biomass on Hardmask Layer , 2011 .

[13]  Bo-Tau Liu,et al.  Effects of Affinity of Solvents on the Haze of Anti-Glare Films , 2012 .

[14]  Bo-Tau Liu,et al.  A novel method to control inner and outer haze of an anti-glare film by surface modification of light-scattering particles. , 2010, Journal of colloid and interface science.

[15]  C. Grant Willson,et al.  Implementation of an imprint damascene process for interconnect fabrication , 2006 .

[16]  J. Maltabes,et al.  High resolution defect inspection of step and flash imprint lithography for 32 nm half-pitch patterning , 2008, SPIE Advanced Lithography.

[17]  C. Bowen,et al.  Angle dependent optical properties of polymer films with a biomimetic anti-reflecting surface replicated from cylindrical and tapered nanoporous alumina , 2012, Nanotechnology.

[18]  Satoshi Takei.  UV nanoimprint lithography of 70 nm half pitch line pattern using plant-based resist material with lactulose derivative derived from biomass and medicinal drugs , 2012 .

[19]  Seung-Woo Lee,et al.  Highly sensitive biosensing using arrays of plasmonic Au nanodisks realized by nanoimprint lithography. , 2011, ACS nano.

[20]  C. Grant Willson,et al.  Ultraviolet curable branched siloxanes as low-k dielectrics for imprint lithography , 2013 .

[21]  Satoshi Takei.  Development of Ultraviolet Crosslinking Glucose-Based Resist Materials for Advanced Electronic Device Applications Using Nanoimprint Lithography , 2011 .

[22]  Takahiro Kozawa,et al.  Eco-friendly electron beam lithography using water-developable resist material derived from biomass , 2012 .

[23]  C. G. Wilson,et al.  A Decade of Step and Flash Imprint Lithography , 2009 .

[24]  D. K. Owens,et al.  Estimation of the surface free energy of polymers , 1969 .

[25]  C. Grant Willson,et al.  Simulation and design of planarizing materials for reverse-tone step and flash imprint lithography , 2008 .

[26]  M. Kechouane,et al.  Nanocrystalline ZnO film deposited by ultrasonic spray on textured silicon substrate as an anti-reflection coating layer , 2012 .

[27]  S. V. Sreenivasan,et al.  Mask replication using jet and flash imprint lithography , 2011, Photomask Technology.

[28]  Wai-Yeung Wong,et al.  A Polyferroplatinyne Precursor for the Rapid Fabrication of L10‐FePt‐type Bit Patterned Media by Nanoimprint Lithography , 2012, Advanced materials.