In this study, YSZ thin films with different Y2O3 content have been prepared by electron beam evaporation on different types of substrates. The film properties such as surface roughness, microstructure, refractive index and transmission spectra were characterized by using Scanning Probe Microscopy (SPM), X-ray diffraction, SEM, ellipsometer and spectrophotometer respectively. The results indicate that the film properties and microstructure correlate with the annealing process dramatically. It is found the film structure undergoes from amorphous to tetragonal phase then ultimately to tetragonal and monoclinic phase with the temperature increasing from 100 to 1100°C, while the surface roughness increases from 1.3 to 24.6nm, and the refractive index varies from 1.86 to 2.02. XRD analysis shows the grain size increased with the annealing temperature, the reduction of defect and surface compact incurred by the high temperature process results in the increase of refractive index. Further investigations show that the optical properties of YSZ films have little effect with the content of Y2O3 and the variation of refractive index is caused by the compactness due to the crystallization of the films under high temperature.
[1]
R. Garvie.
THE OCCURRENCE OF METASTABLE TETRAGONAL ZIRCONIA AS A CRYSTALLITE SIZE EFFECT
,
1965
.
[2]
L. Brus.
Zero-dimensional "excitons" in semiconductor clusters
,
1986
.
[3]
P. Briois,et al.
Effect of O2 gas partial pressure on structures and dielectric characteristics of rf sputtered ZrO2 thin films
,
2007
.
[4]
Joseph Ya-min Lee,et al.
Electrical conduction mechanism in high-dielectric-constant ZrO2 thin films
,
2005,
Microelectron. Reliab..
[5]
A. L. Ortiz,et al.
Effect of ion nitriding on the crystal structure of 3 mol% Y2O3-doped ZrO2 thin-films prepared by the sol–gel method
,
2006
.
[6]
M. Vila,et al.
OPTICAL AND STRUCTURAL STUDY OF EB-PVD ZRO2 THIN FILMS
,
2007
.
[7]
L. Martin,et al.
Effect of the dopant content on the physical properties of Y2O3–ZrO2 and CaO–ZrO2 thin films produced by evaporation and sputtering techniques
,
1999
.