Magnetic and other properties and sputtering behavior of Co-base amorphous alloy films

Magnetic and other properties of Co‐base amorphous alloy films prepared by sputtering are investigated. A detailed magnetic phase diagram with saturation magnetic flux density, crystallization temperature, and zero‐magnetostrictive line on Co‐Ta‐Zr amorphous alloys were obtained, and the technical knowhow to make a film with well‐reproducible characteristics by widely changing the sputtering conditions was related with these physical properties. Especially on alloy sputtering, a phenomenological model for elucidating a composition difference between film and target is presented. After these studies, the film characteristics of Bs=12 kG, Tx=450 °C, ‖λs‖<10−8, Hc<10 mOe, and permeabilities of μ(1 MHz)=7000, μ(100 MHz)=2000 for the single film of 2 μm in thickness and of μ(1 MHz)=4000, μ(100 MHz)=800 for the insulator‐sandwiched multilayered film of 10 μm are obtained, and these well‐balanced values enable us to apply the materials for high‐frequency recording head.

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