Semi-empirical interconnect resistance model for advanced technology nodes: A model apt for materials selection based upon test line resistance measurements
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G. Groeseneken | R. Degraeve | D. Linten | A. Thean | I. Ciofi | Z. Tokei | Ph J. Roussel | R. Baert | N. Jourdan | V. V. Gonzalez | J. Bommels | V. Vega Gonzalez | A. Thean | R. Degraeve | D. Linten | G. Groeseneken | N. Jourdan | P. Roussel | J. Bommels | Z. Tokei | R. Baert | I. Ciofi
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