Ion‐Bombardment Etching of Synthetic Fibers. II

Ion‐bombardment etching of synthetic polymers is shown to result in an actual preferential removal of material in a manner similar to that producing the etch on natural polymers and on inorganic materials and metals. It is also shown that heat has little effect on the over‐all etch pattern produced. In addition evidence is given relating the structures revealed by ion‐bombardment etching and the low‐angle x‐ray periods which have been reported in the literature for polyethylene.