Low-Temperature Chemical Vapor Deposition of SiCN for Hybrid Bonding
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Hitoshi Habuka | T. Iwata | F. Inoue | F. Nagano | K. Onishi
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[2] F. Inoue,et al. Influence of Composition of SiCN as Interfacial Layer on Plasma Activated Direct Bonding , 2019, ECS Journal of Solid State Science and Technology.