Bottom Dielectric Isolation to Suppress Sub-Fin Parasitic Channel of Vertically-Stacked Horizontal Gate-All-Around Si Nanosheets Devices
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Weihai Bu | Lei Cao | H. Yin | Yang Liu | Qingzhu Zhang | Jiaxin Yao | K. Luo | Zhenhua Wu | P. Zhao | Yanna Luo | Haoqing Xu | Yongqin Wu