论文信息 - A novel doping technology for ultra-shallow junction fabrication : boron diffusion from boron-adsorbed layer by rapid thermal annealing - 字舞流文

A novel doping technology for ultra-shallow junction fabrication : boron diffusion from boron-adsorbed layer by rapid thermal annealing

Mitsumasa Koyanagi | Hiroyuki Kurino | Kazuhiro Hane | Takashi Matsuura | K. Park | M. Koyanagi | H. Kurino | K. Hane | Y. Song | T. Matsuura | Ki-Tae Park | Ki Seon Kim | Yun Heub Song | Ki-Seon Kim

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