Controlling the shapes of coated silicon substrates via magnetic fields, a progress report

We describe our progress in developing a method for correcting residual figure errors in X-ray mirrors. The technology has applications to both synchrotron radiation beamlines and X-ray astronomy. Our concept is to develop mirrors that are on the order of a millimeter thick. A magnetic smart material (MSM) is deposited onto the mirror substrate (silicon) and coated with a magnetically hard material. The shape of the mirror can be controlled by applying an external magnetic field to the mirror. This causes the MSM to expand or contract, thereby applying a magnetostrictive stress to the mirror and changing its shape. The shape change is maintained after the field has been removed by the magnetic hard material, which retains part of the field and prevents the MSM from relaxing. Here we present the results of shaping 200 µm thick silicon (100) 14 × 2 mm cantilevers and 50 × 50 × 0.1 mm substrates. We demonstrate that not only can a sizable deflection be created, but it can also be retained for ∼ 60 hours.