Direct writing laser lithography for production of micro structures

Abstract The possibilities for a direct write on wafer laser lithographic tool are discussed. The requirements for such a system are fast writing, using standard photoresists, of submicron structures. In order to be able to complete a system design, a number of physical parameters of laser focus — resist interaction have been studied and results are presented. In addition, an experimental and theoretical analysis of the ratio between spot size and pixel size is given.