论文信息 - Thermal Stability Improvement of Ni–Germano silicide Utilizing Ni–Pd Alloy for Nanoscale CMOS Technology - 字舞流文

Thermal Stability Improvement of Ni–Germano silicide Utilizing Ni–Pd Alloy for Nanoscale CMOS Technology

S. Jung | S. Oh | J. Yun | Z. Zhong | H. Ji | Han-Seob Cha | Y.J. Kim | W. Lee | Y.Y. Zhang | Y. Kim | J. Wang | H.D. Lee