A Modelisation of the temperature dependence of the Fowler-Nordheim current in EEPROM memories
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[1] R. Bouchakour,et al. Study of signal programming to improve EEPROM cell reliability , 2000, Proceedings of the 43rd IEEE Midwest Symposium on Circuits and Systems (Cat.No.CH37144).
[2] Tunneling injection temperature dependence in EEPROM cell , 2007 .
[3] G. Salace,et al. Si–SiO2 barrier height and its temperature dependence in metal-oxide-semiconductor structures with ultrathin gate oxide , 2002 .
[4] L. Esaki,et al. Tunneling in a finite superlattice , 1973 .
[5] Energy and temperature dependence of electron effective masses in silicon , 2002 .
[6] G. Micolau,et al. An experimental method allowing quantifying and localizing failed cells of an EEPROM CAST after a retention test , 2008 .
[7] R. Bouchakour,et al. A new physical-based compact model of floating-gate EEPROM cells , 2001 .
[8] Rachid Bouchakour,et al. Extraction of Fowler-Nordheim parameters of thin SiO/sub 2/ oxide film including polysilicon gate depletion: validation with an EEPROM memory cell , 2000, 2000 IEEE International Symposium on Circuits and Systems. Emerging Technologies for the 21st Century. Proceedings (IEEE Cat No.00CH36353).
[9] Ken Uchida,et al. Yield and reliability of MNOS EEPROM products , 1989 .
[10] Bruno Ricco,et al. Fast tunneling programming of nonvolatile memories , 2000 .
[11] William D. Brown,et al. Nonvolatile Semiconductor Memory Technology , 1997 .
[12] R. Fowler,et al. Electron Emission in Intense Electric Fields , 1928 .
[13] M. Houssa,et al. Effect of fixed dielectric charges on tunnelling transparency in MIM and MIS structures , 2004 .