Deposition of Films from a Mixture of Hexamethylcyclotrisilazane Vapor and Argon in Inductively Coupled Plasma

[1]  E. Maslowsky.  Vibrational Spectra of Organometallics , 2018 .

[2]  V. Shayapov,et al.  Synthesis and Properties of Thin Films Formed by Vapor Deposition from Tetramethylsilane in a Radio-Frequency Inductively Coupled Plasma Discharge , 2018, Glass Physics and Chemistry.

[3]  Xiaojie Yan,et al.  Fabrication of pH-responsive hydrophilic/hydrophobic Janus cotton fabric via plasma-induced graft polymerization , 2017 .

[4]  I. Asanov,et al.  Study of chemical bonds and element composition of silicon oxycarbonitride films by the methods of XP-, IR-, and energy-dispersive spectroscopy , 2017, Glass Physics and Chemistry.

[5]  C. Eberl,et al.  Rapidly prototyping biocompatible surfaces with designed wetting properties via photolithography and plasma polymerization , 2017 .

[6]  V. Shayapov,et al.  Chemical composition of an inductively coupled hexamethyldisilazane–argon plasma and properties of films grown in this plasma , 2016, Inorganic Materials.

[7]  F. A. Kuznetsov,et al.  Synthesis of thin silicon carbonitride films from hexamethyldisilazane in an inductively coupled plasma reactor , 2015, Inorganic Materials.

[8]  V. Shayapov,et al.  Scanning probe microscopy and nanoindentation studies of silicon carbonitride films obtained by PECVD from hexamethyldisilazane , 2014 .

[9]  Chun Li,et al.  Atmospheric Pressure Plasma Polymerization of Super-Hydrophobic Nano-films Using Hexamethyldisilazane Monomer , 2014, Plasma Chemistry and Plasma Processing.

[10]  B. Beckhoff,et al.  Silicon carbonitride nanolayers - Synthesis and chemical characterization , 2012 .

[11]  N. Fainer.  From organosilicon precursors to multifunctional silicon carbonitride , 2012, Russian Journal of General Chemistry.

[12]  S. Guruvenket,et al.  Atmospheric Pressure Plasma CVD of Amorphous Hydrogenated Silicon Carbonitride (a‐SiCN:H) Films Using Triethylsilane and Nitrogen , 2011 .

[13]  Iwona Blaszczyk-Lezak,et al.  Silicon Carbonitride (SiCN) Films by Remote Hydrogen Microwave Plasma CVD from Tris(dimethylamino)silane as Novel Single-Source Precursor† , 2010 .

[14]  N. Fainer,et al.  Use of hexamethylcyclotrisilazane for preparation of transparent films of complex compositions , 2009 .

[15]  A. Grill,et al.  Ultralow dielectric constant pSiCOH films prepared with tetramethylcyclotetrasiloxane as skeleton precursor , 2008 .

[16]  J. Heberlein,et al.  Thermal plasma chemical vapor deposition of wear-resistant, hard Si–C–N coatings , 2006 .

[17]  A. Orlikovsky,et al.  Fine-line plasma-enhanced processes on the basis of a set of pilot units with a scalable inductively coupled plasma source for use in microelectronics , 2006 .

[18]  A. Grill,et al.  Structure of low dielectric constant to extreme low dielectric constant SiCOH films: Fourier transform infrared spectroscopy characterization , 2003 .

[19]  I. Lundström,et al.  Ellipsometric sensitivity to halothane vapors of hexamethyldisiloxane plasma polymer films , 1997 .

[20]  D. Hess,et al.  Characterization of Silicon Nitride and Silicon Carbonitride Layers from 1,1,3,3,5,5‐Hexamethylcyclotrisilazane Plasmas , 1988 .

[21]  D. Hess,et al.  Deposition chemistry and structure of plasma-deposited silicon nitride films from 1,1,3,3,5,5-hexamethylcyclotrisilazane , 1988 .

[22]  D. Hess,et al.  Plasma-enhanced chemical vapor deposition of silicon nitride from 1,1,3,3,5,5-hexamethylcyclotrisilazane and ammonia , 1987 .

[23]  A. Wrobel.  Aging Process in Plasma-Polymerized Organosilicon Thin Films , 1985 .

[24]  M. Kryszewski,et al.  Oligomeric Products in Plasma=Polymerized Organosilicones , 1983 .

[25]  M. Wertheimer,et al.  Polymerization of Organosilicones in Microwave Discharges , 1980 .

[26]  M. Kryszewski,et al.  Structure of glow discharge polysilazane thin films , 1976 .

[27]  W. R. Angus.  The Identification of Molecular Spectra , 1941, Nature.

[28]  B. Majlis,et al.  Fabrication of transparent bistable switching memory device using plasmapolymerized hexamethyldisiloxane layers with embedded graphene quantum dots , 2018 .

[29]  T. P. Smirnova,et al.  Dehydrogenation mechanism for SiNx:H layers prepared from hexamethylcyclotrisilazane , 1996 .

[30]  M. Kryszewski,et al.  Preparation, structure, and some properties of organosilicon thin polymer films obtained by plasma polymerization , 1991 .

[31]  M. Wertheimer,et al.  Polymerization of Organosilicones in Microwave Discharges. II. Heated Substrates , 1981 .

[32]  G. Dieke.  The hydrogen molecule wavelength tables of Gerhard Heinrich Dieke , 1972 .

[33]  C. Rao,et al.  Chemical Applications of Infrared Spectros-copy , 1963 .

[34]  A. G. Gaydon,et al.  The identification of molecular spectra , 1950 .