论文信息 - Electron-Beam-Induced Decomposition Mechanisms of High-Sensitivity Chlorinated Resist ZEP520A

Electron-Beam-Induced Decomposition Mechanisms of High-Sensitivity Chlorinated Resist ZEP520A

ZEP520A (1:1 copolymer of α-chloromethacrylate and α-methylstyrene, ZEON) is a main-chain scission-type positive-tone resist used for electron beam (EB) lithography and is known for its high sensitivity and high resolution. In this study, ZEP520A was irradiated using a 100 kV EB, and the decomposition mechanisms were analyzed by gel permeation chromatography, Fourier transform IR spectroscopy, NMR spectroscopy, and pulse radiolysis. Chlorines were confirmed to easily dissociate as Cl- ions (dissociative electron attachment, DEA) and ZEP520A underwent β-scission. Multiple channels could be considered for the main-chain scission, including DEA and the charge transfer complex between phenyl radical cations and Cl- ions.

[1] W. Schnabel,et al. On the kinetics of polymer degradation in solution—VII. Laser flash photolysis of poly-α-methylstyrene in solution , 1978 .

[2] M. Washio,et al. Study on sensitized degradation and crosslinking of polymers by means of picosecond pulse radiolysis , 1985 .

[3] Hiroki Yamamoto,et al. Study on Positive–Negative Inversion of Chlorinated Resist Materials , 2011 .

[4] Masaya Notomi,et al. Quantum Wire Fabrication by E-Beam Elithography Using High-Resolution and High-Sensitivity E-Beam Resist ZEP-520 , 1992 .

[5] W. Schnabel,et al. Laser flash photolysis studies on excited singlet states of benzene, toluene, p-xylene, polystyrene, and poly-α-methylstyrene , 1980 .

[6] O. Güven,et al. Radiation-induced degradation of galactomannan polysaccharides , 2007 .

[7] A. Charlesby. Atomic Radiation and Polymers , 1960 .

[8] W. Schnabel,et al. On the mechanism of the photolysis of polystyrene in chloroform solution. Laser flash photolysis studies , 1980 .

[9] W. Schnabel,et al. Picosecond pulse radiolysis and laser flash photolysis studies on polymer degradation of polystyrene and poly-α-methylstyrene , 1981 .

[10] W. Schnabel,et al. On the kinetics of polymer degradation. X—Laser flash photolysis of poly-α-methylstyrene in chloroform solution , 1983 .