论文信息 - LASER Anneal to Enable Ultimate CMOS Scaling with PMOS Band Edge Metal Gate/High-K Stacks - 字舞流文

LASER Anneal to Enable Ultimate CMOS Scaling with PMOS Band Edge Metal Gate/High-K Stacks

D. Gilmer | S. Samavedam | J. Schaeffer | M. Raymond | C. Capasso | W. Taylor | R. Hegde | D. Triyoso | J. Smith | D. Roan | G. Spencer