Isotope effects on plasma species of Ar/H2/D2 plasmas
暂无分享,去创建一个
[1] V. Godyak,et al. Determination of Ar metastable atom densities in Ar and Ar/H2 inductively coupled low-temperature plasmas , 2013 .
[2] T. Schwarz-Selinger,et al. Ion chemistry in H2-Ar low temperature plasmas , 2013 .
[3] W. Jacob,et al. Quantitative determination of mass-resolved ion densities in H2-Ar inductively coupled radio frequency plasmas , 2013 .
[4] A. Wendt,et al. Noninvasive, real-time measurements of plasma parameters via optical emission spectroscopy , 2013 .
[5] S. Iijima,et al. A roll-to-roll microwave plasma chemical vapor deposition process for the production of 294 mm width graphene films at low temperature , 2012 .
[6] D. Graves,et al. Hydrogenation and surface density changes in hydrocarbon films during erosion using Ar/H2 plasmas , 2011 .
[7] P. R. Harris,et al. Molecular size effect in the chemical sputtering of a-C:H thin films by low energy H+, H2+, and H3+ ions , 2011 .
[8] S. Iijima,et al. Low-temperature synthesis of large-area graphene-based transparent conductive films using surface wave plasma chemical vapor deposition , 2011 .
[9] Jon Tomas Gudmundsson,et al. Low pressure hydrogen discharges diluted with argon explored using a global model , 2010 .
[10] Vijay Kumar,et al. Electron-impact cross sections for deuterated hydrogen and deuterium molecules , 2010 .
[11] Takashi Kimura,et al. Properties of inductively coupled rf Ar/H2 plasmas: Experiment and global model , 2010 .
[12] M. Schlüter,et al. Molecular dynamics simulations of synergistic erosion of amorphous hydrocarbon films , 2009 .
[13] C. Hopf,et al. Synergistic erosion process of hydrocarbon films: a molecular dynamics study , 2008 .
[14] C. Hopf,et al. Bombardment of graphite with hydrogen isotopes: A model for the energy dependence of the chemical sputtering yield , 2005 .
[15] F. Celii,et al. Study of C4F8/N2 and C4F8/Ar/N2 plasmas for highly selective organosilicate glass etching over Si3N4 and SiC , 2003 .
[16] C. Hopf,et al. Chemical sputtering of hydrocarbon films , 2003 .
[17] C. Hopf,et al. Chemical sputtering of hydrocarbon films by low-energy Ar + ion and H atom impact , 2002 .
[18] W. Jacob,et al. Plasma chemical vapor deposition of hydrocarbon films: The influence of hydrocarbon source gas on the film properties , 1999 .
[19] M. Lieberman,et al. Hydrogenation of polysilicon thin-film transistor in a planar inductive H/sub 2//Ar discharge , 1999, IEEE Electron Device Letters.
[20] G. K. Walters,et al. Patterning of hydrogen-passivated Si(100) using Ar(3P0,2) metastable atoms , 1999 .
[21] J. Gudmundsson. Ion energy distribution in H2/Ar plasma in a planar inductive discharge , 1999 .
[22] T. George,et al. Kinematic Model for Reaction. II. Ion–Molecule Reactions Involving H2 and D2 , 1969 .