论文信息 - Differential sputtering of MgO/Au cermet films and its application to high-yield secondary-electron emitters - 字舞流文

Differential sputtering of MgO/Au cermet films and its application to high-yield secondary-electron emitters

John C. C. Fan | V. Henrich | J. C. Fan | John C. C. Fan

[1] John C. C. Fan,et al. High‐efficiency secondary‐electron emission from sputtered MgO–Au cermets , 1973 .

[2] V. Henrich. Fast, Accurate Secondary‐Electron Yield Measurements at Low Primary Energies , 1973 .

[3] L. Holland,et al. The influence of sputtering and transport mechanisms on target etching and thin film growth in rf systems—I. Target processes , 1972 .

[4] G. Wehner,et al. Alloy Sputtering Studies with in situ Auger Electron Spectroscopy , 1971 .

[5] M. Kaminsky,et al. Atomic and Ionic Impact Phenomena on Metal Surfaces , 1966 .

[6] G. K. Wehner,et al. Sputtering Yields for Low Energy He+‐, Kr+‐, and Xe+‐Ion Bombardment , 1962 .

[7] G. K. Wehner,et al. Sputtering Yields of Metals for Ar+ and Ne+ Ions with Energies from 50 to 600 ev , 1961 .

[8] G. Wehner. Low-Energy Sputtering Yields in Hg , 1958 .

[9] G. Wehner. Sputtering Yields for Normally Incident Hg + -Ion Bombardment at Low Ion Energy , 1957 .

[10] D. J. Barber,et al. Review: Sputtering mechanisms for amorphous and polycrystalline solids , 1973 .

[11] C. Nordling,et al. Escape Depths of X-ray Excited Electrons , 1972 .