论文信息 - Plasma-enhanced chemical vapor deposition of low-loss SiON optical waveguides at 15-microm wavelength.

Plasma-enhanced chemical vapor deposition of low-loss SiON optical waveguides at 15-microm wavelength.

Good optical-quality SiON layers deposited upon a SiO(2) buffer layer placed upon silicon wafers have been obtained by using plasma-enhanced chemical vapor deposition from SiH(4), NH(3), and N(2)O. Optical planar waveguides with a thickness of 5 microm and a refractive index of 1.470 have been deposited and investigated in the wavelength region of 1.3-1.6 microm. Three absorption bands at 1.40, 1.48, and 1.54 microm have been detected and interpreted as Si-OH, N-H, and Si-H vibrational modes, respectively. Absorption losses of 3.8 dB/cm at 1.4 microm and 3.2 dB/cm at 1.51 microm have been measured. A mild annealing at approximately 800 degrees C completely removes the band at 1.40 microm, whereas strong reduction of absorption at 1.51 microm requires 3 h of annealing at 1100 degrees C. As a result, propagation losses of 0.36 to 0.54 dB/cm have been measured at 1.54-microm wavelength.

[1] David E. Zelmon,et al. Low loss optical waveguides fabricated by thermal nitridation of oxidized silicon , 1985 .

[2] C. Denisse,et al. Annealing of plasma silicon oxynitride films , 1986 .

[3] C. Henry,et al. Low loss Si(3)N(4)-SiO(2) optical waveguides on Si. , 1987, Applied optics.

[4] T. S. Eriksson,et al. Infrared optical properties of silicon oxynitride films: Experimental data and theoretical interpretation , 1986 .

[5] D. K. Lam,et al. Low temperature plasma chemical vapor deposition of silicon oxynitride thin-film waveguides. , 1984, Applied optics.

[6] Mitsuho Yasu,et al. Fabrication of SiO2-TiO2 glass planar optical waveguides by flame hydrolysis deposition , 1983 .

[7] A. Kuiper,et al. Hydrogen incorporation in silicon (oxy)nitride thin films , 1988 .

[8] M. Rand,et al. Silicon oxynitride films on fused silica for optical waveguides. , 1972, Applied Optics.

[9] D. E. Bossi,et al. Optical properties of silicon oxynitride dielectric waveguides. , 1987, Applied optics.

[10] Pierre Gidon,et al. Integrated Optics On Silicon Substrate : A Way To Achieve Complex Optical Circuits , 1986, Other Conferences.

[11] William A. Lanford,et al. Hydrogen content of a variety of plasma‐deposited silicon nitrides , 1982 .

[12] I. K. Naik. Low‐loss integrated optical waveguides fabricated by nitrogen ion implantation , 1983 .