Evolution of Silicon Cleaning Technology Over the Last Twenty Years
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Takeshi Hattori | P. Besson | Jerzy Ruzyllo | Richard E. Novak | P. Mertens | J. Ruzyllo | P. Besson | T. Hattori | P. Mertens | R. Novak
[1] Etching of Thermal Oxides in Low Pressure Anhydrous HF / CH 3 OH Gas Mixture at Elevated Temperature , 1993 .
[2] T. Hattori,et al. Ultraclean Surface Processing of Silicon Wafers , 1998 .
[3] Koichiro Saga,et al. Contamination Removal by Single‐Wafer Spin Cleaning with Repetitive Use of Ozonized Water and Dilute HF , 1998 .
[4] T. Hattori,et al. Detection of 30–40-nm Particles on Bulk-Silicon and SOI Wafers Using Deep UV Laser Scattering , 2006, IEEE Transactions on Semiconductor Manufacturing.
[5] Marc Heyns,et al. Advanced wet and dry cleaning coming together for next generation , 1999 .