Novel single p+poly-Si/Hf/SiON gate stack technology on silicon-on-thin-buried-oxide (SOTB) for ultra-low leakage applications
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T. Hiramoto | S. Kamohara | H. Oda | T. Mizutani | H. Makiyama | N. Sugii | Y. Yamaguchi | T. Hiramoto | H. Oda | T. Mizutani | H. Makiyama | T. Yamashita | S. Kamohara | N. Sugii | Y. Yamamoto | Y. Yamaguchi | Y. Yamamoto | T. Yamashita | M. Kobayashi | M. Kobayashi