Study on quasiperiodic Ta/Al multilayer films by x‐ray diffraction

Quasiperiodic (Fibonacci) Ta/Al multilayer films with Ta(110) and Al(111) textures were fabricated by magnetron sputtering. The structure of the multilayers was characterized in detail by x‐ray diffraction. The diffraction peaks at low and high angles can be indexed by the projection method from the high‐dimension periodic structure. The experimental results were in good agreement with the numerical calculation using the model for the compositionally modulated multilayers. The diffraction spectrum of the quasiperiodic Ta/Al multilayers is totally different from that of periodic structure, and the possible application of Fibonacci films as optical elements in a soft x‐ray region is discussed.