Atomic Layer Deposition: Effect of Various Oxidants on Reaction Mechanisms, Self-Limiting Natures and Structural Characteristics of Al2 O3 Films Grown by Atomic Layer Deposition (Adv. Mater. Interfaces 14/2018)
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Y. Duan | Zheng Chen | Haoran Wang | Yunfei Liu | Kun Li | Hui Liu | Fangyi Chen | Xiangchen Xu | Pengpeng Xiong