论文信息 - Comparative measurements on atomic layer deposited Al2O3 thin films using ex situ table top and mapping ellipsometry, as well as X-ray and VUV reflectometry - 字舞流文

Comparative measurements on atomic layer deposited Al2O3 thin films using ex situ table top and mapping ellipsometry, as well as X-ray and VUV reflectometry

M. Fried | P. Petrik | M. Lemberger | G. Juhász | C. Major | B. Fodor | E. Agócs | P. Kozma | A. Nutsch | T. Gumprecht | G. Roeder | O. Polgár | Milán Janosov