Fabrication of efficient microaxicon by direct electron-beam lithography for long nondiffracting distance of Bessel beams for optical manipulation
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Hong Wang | Hanben Niu | Xiang Peng | Balpreet Singh Ahluwalia | X.-C. Yuan | W. C. Cheong | Hong Wang | Xiang Peng | H. Niu | X. Yuan | B. Ahluwalia | Lin Zhang | W. Cheong | Lin Zhang
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