Simultaneous template optimization and mask assignment for DSA with multiple patterning

Block Copolymer Directed Self-Assembly (DSA) is a promising technique to print contacts/vias for the 10nm technology node and beyond. By using hybrid lithography that cooperates DSA with multiple patterning, multiple masks are used to print the DSA templates and then the templates can be used to guide the self-assembly of the block copolymer. In this paper, we propose approaches to solve the simultaneous template optimization and mask assignment problem for DSA with multiple patterning. We verified in experiments that our approaches remarkably outperform the state of the art work in reducing the manufacturing cost.

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