Electron multi-beam technology for mask and wafer writing at 0.1nm address grid

An overview of electron beam tool configurations is provided. The adoption of multi-beam writing is mandatory in order to fulfill industrial needs for 11nm HP nodes and below. IMS Nanofabrication realized a 50keV electron multibeam proof-of-concept (POC) tool confirming writing principles with 0.1nm address grid and lithography performance capability. The new architecture will be introduced for mask writing at first, but has also the potential for 1xmask (master template) and direct wafer writing. The POC system achieves the predicted 5nm 1sigma blur across the 82μm x 82μm array of 512 x 512 (262,144) programmable 20nm beams. 24nm HP has been demonstrated and complex patterns have been written in scanning stripe exposure mode. The first production worthy system for the 11nm HP mask node is scheduled for 2014 (Alpha), 2015 (Beta) and 1st generation HVM mask writer tools in 2016. Implementing a multi-axis column configuration, 50x / 100x productivity enhancements are possible for direct 300mm / 450mm wafer writing.

[1]  T. van de Peut,et al.  Throughput enhancement technique for MAPPER maskless lithography , 2010, Advanced Lithography.

[2]  Elmar Platzgummer,et al.  eMET POC: realization of a proof-of-concept 50 keV electron multibeam mask exposure tool , 2011, Photomask Technology.

[3]  Ted Prescop,et al.  E-beam direct write (EBDW) as complementary lithography , 2010, Photomask Technology.

[4]  Elmar Platzgummer,et al.  50-keV electron multibeam mask writer for the 11-nm HP node: first results of the proof-of-concept electron multibeam mask exposure tool , 2012 .

[5]  Mark A. McCord,et al.  Reflective electron-beam lithography performance for the 10nm logic node , 2012, Photomask Technology.

[6]  Hans-Joachim Doering,et al.  Multi-shaped beam: development status and update on lithography results , 2011, Advanced Lithography.

[7]  Elmar Platzgummer,et al.  Results of proof-of-concept 50keV electron multi-beam mask exposure tool (eMET POC) , 2012, Other Conferences.

[8]  Elmar Platzgummer.  Maskless lithography and nanopatterning with electron and ion multibeam projection , 2010, Advanced Lithography.

[9]  Jin Choi,et al.  The requirements for the future e-beam mask writer: statistical analysis of pattern accuracy , 2011, Photomask Technology.

[10]  Akio Yamada,et al.  Cell projection use and multi column approach for throughput enhancement of EBDW system , 2010, Photomask Technology.

[11]  Damon M. Cole,et al.  Future mask writers requirements for the sub-10nm node era , 2012, Photomask Technology.

[12]  Burn Jeng Lin.  Future of multiple-e-beam direct-write systems , 2012 .

[13]  Kenichi Saito,et al.  EBM-8000: EB mask writer for product mask fabrication of 22nm half-pitch generation and beyond , 2011, Photomask Technology.