The impact of sub monolayers of HfO2 on the device performance of high-K based transistors
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Luigi Pantisano | Marc Heyns | Yasuhiro Shimamoto | S. De Gendt | L. Ragnarsson | M. Heyns | L. Pantisano | S. Gendt | Y. Shimamoto | Lars-Ake Ragnarsson | Kaushik | Si Saito | S. Saito