Improved alternating projection algorithm for pattern synthesis with dual polarised conformal arrays

In this study, an improved alternating projection algorithm is presented for the pattern synthesis of a dual-polarised conformal array. An extra desired pattern is introduced to find an appropriate solution in the process of projecting the desired solution set to the feasible solution set. Virtual interferences are introduced to modify the solution iteratively based on the deviation between the obtained and desired pattern. Finally, the authors' algorithm is applied to dual-polarised conformal arrays and can achieve a suitable solution set between the predefined upper and lower bounds, which can synthesise both orthogonal polarisation components of the array pattern more effectively. Simulation examples are presented to verify the validity of the proposed algorithm.

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