论文信息 - Thermal response of Ru electrodes in contact with SiO2 and Hf-based high-k gate dielectrics - 字舞流文

Thermal response of Ru electrodes in contact with SiO2 and Hf-based high-k gate dielectrics

D. Kwong | B. Lee | P. Majhi | P. Lysaght | H. Alshareef | H. Harris | C. Huffman | H. Wen | K. Choi | H. Luan | Y. Senzaki | B. Foran | G. Lian | M. Campin