Pulsed electron beam facility (GESA) for surface treatment of materials

Abstract The paper describes the new pulsed electron beam facilities GESA designed for material surface treatment. These facilities ensure the possibility to realize melting depths of materials in the range of 10–100 μm. Parameters of the electron beam produced are as follows: electron energy 50–400 keV; beam current 200–500 A, beam cross-section 50–100 cm 2 ; pulse duration 5–250 μs, maximum power density at the target −6 MW/cm 2 , maximum energy density 500 J/cm 2 . All beam parameters are controlled independently.