论文信息 - Chloride-Based CVD at High Rates of 4H-SiC on On-Axis Si-Face Substrates - 字舞流文

Chloride-Based CVD at High Rates of 4H-SiC on On-Axis Si-Face Substrates

A. Henry | O. Kordina | S. Leone | Yuan Lin | H. Pedersen | F. C. Beyer | S. Andersson | E. Janzén