Synthesis of TiO2 films by ICP-assisted DC magnetron sputtering
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Jung-Joong Lee | J. Joo | Girak Lee | D. Jung | B. Park
[1] Misook Kang. Preparation of TiO2 photocatalyst film and its catalytic performance for 1,1′-dimethyl-4,4′-bipyidium dichloride decomposition , 2002 .
[2] Hideo Hosono,et al. Photocatalytic TiO2 thin film deposited onto glass by DC magnetron sputtering , 2001 .
[3] D. Depla,et al. Electronic and optical characterisation of TiO2 films deposited from ceramic targets. , 2001 .
[4] J. Lim,et al. Mechanical properties of titanium nitride coatings deposited by inductively coupled plasma assisted direct current magnetron sputtering , 2000 .
[5] J. Schneider,et al. Reactive ionized magnetron sputtering of crystalline alumina coatings , 1998 .
[6] N. Martin,et al. Characterizations of titanium oxide films prepared by radio frequency magnetron sputtering , 1996 .
[7] Lars Hultman,et al. Development of preferred orientation in polycrystalline TiN layers grown by ultrahigh vacuum reactive magnetron sputtering , 1995 .
[8] D. Mergel,et al. Nucleation and growth in TiO2 films prepared by sputtering and evaporation , 1994 .
[9] A. Marigo,et al. Influence of substrate on structural properties of TiO2 thin films obtained via MOCVD , 1994 .
[10] Jeffrey Hopwood,et al. Metal ion deposition from ionized mangetron sputtering discharge , 1994 .
[11] J. Hopwood,et al. Magnetron sputter deposition with high levels of metal ionization , 1993 .
[12] S. Schiller,et al. Reactive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide films , 1979 .