Drift-Free pH Detection With Silicon Nanowire Field-Effect Transistors

The drift of drain current (ID) in silicon nanowire field-effect transistor sensors is analyzed under various conditions of pHs and liquid gate voltages (VLG). It is found that H+ penetration into Helmholtz layer or sensing insulator is the cause of the current drift. To suppress the drift, a novel and fast measurement method with a two-step VLG is proposed and demonstrated. The drift could be completely suppressed by controlling the duration of the first step pulse. The time required to remove the ID drift is significantly reduced by the proposed method, from ~1200 s to below 100 s on average.

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