Multi-jet hollow cathode discharge for remote polymer deposition

Abstract A new method for large area polymer deposition, based on a r.f. multi-jet plasma source is presented. Plasma jets with conical shape are extracted from a common r.f. hollow cathode discharge (HCD). The performance of the plasma sources with a single row of 14 nozzles and with a two-row matrix of 27 nozzles was characterized. At low pressure ( 10 mbar) intense plasma jets are extracted from all nozzles. Their length is a function of r.f. power and pressure, and ranges between few millimeters and 10 cm. The ignition power increases from 125 to 245 W with pressure increasing from 10 to 45 mbar. Jets can be sustained down to 3 W for 10 mbar and down to 7 W for 45 mbar. This work shows the ability of the multi-jet plasma source for large area polymer film deposition on substrates such as metal and plastic foils, membranes, textile, paper or web. To improve the homogeneity of the film and to avoid the frequent removal of polymeric residue from the HCD walls, a remote process was developed. A carrier gas (argon) is introduced into the primary HCD. The monomer (C4F8) is distributed homogeneously outside the plasma source at a distance of 35 mm from the anode surface and 12 mm from the coated substrate. Typical deposition rate is 15 nm/min.

[1]  S. Berg,et al.  Radio frequency plasma jet applied to coating of internal walls of narrow tubes , 1993 .

[2]  J. Engemann,et al.  Langmuir probe measurements in commercial plasma plants , 1994 .

[3]  D. Korzec,et al.  Radio frequency hollow cathode discharge for large‐area double‐sided foil processing , 1995 .

[4]  M. Tichý,et al.  A Collisional Model of the Positive Ion Collection by a Cylindrical Langmuir Probe , 1994 .

[5]  S. Wiberley,et al.  Introduction to infrared and Raman spectroscopy , 1965 .

[6]  L. Bardos,et al.  High rate jet plasma-assisted chemical vapour deposition , 1988 .

[7]  A. Bell,et al.  A Review of Recent Advances in Plasma Polymerization , 1979 .

[8]  L. Talbot,et al.  Collisionless Electrostatic Single-Probe and Double-Probe Measurements , 1970 .

[9]  J. Carlsson,et al.  Reactive deposition of diamond and Si carbide films by hydrogen plasma etching of graphite and Si in the r.f. plasma jet , 1993 .

[10]  Z. Zakrzewski,et al.  RESEARCH NOTES: Effect of collisions on positive ion collection by a cylindrical Langmuir probe , 1974 .

[11]  E. Kay,et al.  Plasma polymerization of fluorocarbons in rf capacitively coupled diode system , 1981 .

[12]  J. Tous,et al.  A method for the ion density estimation from the double probe data at medium and higher pressures , 1994 .

[13]  D. Korzec,et al.  Remote and direct microwave plasma deposition of HMDSO films: comparative study , 1995 .

[14]  D. Korzec,et al.  Broad pressure range PTFE surface modification with slot antenna microwave discharge , 1995 .