Effects of scratching directions on AFM-based abrasive abrasion process

AFM-based single abrasive abrasion process is widely employed in the surface micro/nanomachining for fabrication of structures at the nanometer scale. The wear depth and roughness are significantly important in the application of these structures. To study effects of scratching directions on the wear depth and roughness within the wear mark, single groove scratching test and wear test on the surface of polished single crystal silicon were carried out using AFM with a pyramidal diamond tip. Single groove scratching tests indicated that tip geometry leads to different removal states such as cutting and plowing. At the same load, deeper wear depth and rougher surface were produced by using the scratching direction perpendicular to the long axis of the cantilever rather than parallel to the long axis of the cantilever. Surface roughness decreases with respect to the feed scratching perpendicular to the long axis of the cantilever, whereas while scratching along the long axis of the cantilever, the surface roughness is rougher at the small feed. This is attributed to the different stiffness of the cantilever along different scratching directions and different removal states between the tip and sample.

[1]  R. Leoni,et al.  EBL- and AFM-based techniques for nanowires fabrication on Si/SiGe , 2002 .

[2]  Hiroaki Tanaka,et al.  Towards a deeper understanding of wear and friction on the atomic scale—a molecular dynamics analysis , 1997 .

[3]  B. Bhushan,et al.  Scanning and transmission electron microscopies of single-crystal silicon microworn/machined using atomic force microscopy , 1997 .

[4]  Jin-Eui Lee,et al.  Process development of precision surface micro-machining using mechanical abrasion and chemical etching , 2002 .

[5]  Bonnie A. Sheriff,et al.  Nanoscale patterning of alkyl monolayers on silicon using the atomic force microscope. , 2005, Langmuir : the ACS journal of surfaces and colloids.

[6]  M. Rigdahl,et al.  Internal stresses in polyethylene as related to its structure , 1975 .

[7]  P. Blanckenhagen,et al.  Atomic force microscope as a tool for metal surface modifications , 1995 .

[8]  Jee-Gong Chang,et al.  Machining characterization of the nano-lithography process using atomic force microscopy , 2000 .

[9]  K. Hokkirigawa,et al.  An experimental and theoretical investigation of ploughing, cutting and wedge formation during abrasive wear , 1988 .

[10]  Te-Hua Fang,et al.  Effects of AFM-based nanomachining process on aluminum surface , 2003 .

[11]  Chung-Jen Lu,et al.  An investigation of the experimental conditions and characteristics of a nano-wear test , 1995 .

[12]  Vittorio Foglietti,et al.  Atomic force microscopy lithography as a nanodevice development technique , 1999 .

[13]  Toshiro Endo,et al.  Nanoscale layer removal of metal surfaces by scanning probe microscope scratching , 1995 .

[14]  Toshiro Endo,et al.  Micromachining of metal surfaces by scanning probe microscope , 1994 .

[15]  Y. Morimoto,et al.  Nanomachining on Si (100) Surfaces Using an Atomic Force Microscope with Lateral Force Transducer , 2003 .

[16]  S. Tegen,et al.  Surface modifications with a scanning force microscope , 1997 .

[17]  Steven D. Kenny,et al.  Molecular dynamic simulations of nanoscratching of silver (100) , 2004 .

[18]  Karl Eberl,et al.  Controlled mechanical AFM machining of two-dimensional electron systems: fabrication of a single-electron transistor , 2000 .

[19]  Sverre Myhra,et al.  A mechanistic approach to tip-induced nano-lithography of polymer surfaces , 2004 .