Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition

Over the last ten years, expansion of atmospheric pressure plasma solutions for surface treatment of materials has been remarkable, however direct plasma technology for thin film deposition needs still great effort. The objective of this paper is to establish the state of the art on scientific and technologic locks, which have to be opened to consider direct atmospheric pressure plasma-enhanced chemical vapor deposition (AP-PECVD) a viable option for industrial application. Basic scientific principles to understand and optimize an AP-PECVD process are summarized. Laboratory reactor configurations are reviewed. Reference points for the design and use of AP-PECVD reactors according to the desired thin film properties are given. Finally, solutions to avoid powder formation and to increase the thin film growth rate are discussed.

[1]  H. Barankova,et al.  Plasma processes at atmospheric and low pressures , 2008 .

[2]  G. Byrne,et al.  Deposition of Biodegradable Polycaprolactone Coatings Using an In-line Atmospheric Pressure Plasma System , 2009 .

[3]  A. D. Korotaev,et al.  a-C:H films deposited in the plasma of barrier and surface discharges at atmospheric pressure , 1997 .

[4]  P. Dubruel,et al.  Deposition of Polyacrylic Acid Films by Means of an Atmospheric Pressure Dielectric Barrier Discharge , 2009 .

[5]  M. Asandulesa,et al.  Hydrophobic Coatings Obtained in Atmospheric Pressure Plasma , 2009, IEEE Transactions on Plasma Science.

[6]  C. Mayoux,et al.  Comparison Between Air Filamentary and Helium Glow Dielectric Barrier Discharges for the Polypropylene Surface Treatment , 1998 .

[7]  H. Bindslev,et al.  Plasma Chemistry in an Atmospheric Pressure Ar/NH3 Dielectric Barrier Discharge , 2005 .

[8]  Martin H. Schmidt,et al.  Study of an atmospheric pressure glow discharge (APG) for thin film deposition , 2003 .

[9]  F. Massines,et al.  Influence of the Surface Conductivity on the Stability of a Glow Dielectric-Barrier Discharge , 2008, IEEE Transactions on Plasma Science.

[10]  J. Benedikt,et al.  The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure , 2011, 1105.5899.

[11]  T. Nozaki,et al.  Deposition of vertically oriented carbon nanofibers in atmospheric pressure radio frequency discharge , 2006 .

[12]  Hill Pc,et al.  Reaction processes in a He2+( 2 Pi u-->A 2 Sigma g+) flash lamp. , 1993 .

[13]  U. Kortshagen,et al.  Effects of current limitation through the dielectric in atmospheric pressure glows in helium , 2004 .

[14]  Gregor E. Morfill,et al.  Plasma medicine: an introductory review , 2009 .

[15]  S. Büttgenbach,et al.  Micro-structured electrode arrays: atmospheric pressure plasma processes and applications , 2003 .

[16]  F. Massines,et al.  Nano-particle size-dependent charging and electro-deposition in dielectric barrier discharges at atmospheric pressure for thin SiOx film deposition , 2007 .

[17]  M. Wertheimer,et al.  Atmospheric Pressure Deposition of Micropatterned Nitrogen‐Rich Plasma‐Polymer Films for Tissue Engineering , 2005 .

[18]  Nikita Bibinov,et al.  On the influence of metastable reactions on rotational temperatures in dielectric barrier discharges in He-N2 mixtures , 2001 .

[19]  K. Nakamura,et al.  Room-Temperature Silicon Nitrides Prepared with Very High Rates (>50 nm/s) in Atmospheric-Pressure Very High-Frequency Plasma , 2010 .

[20]  T. Nozaki,et al.  Carbon nanotubes deposition in glow barrier discharge enhanced catalytic CVD , 2002 .

[21]  P. C. Jain.  Rotational collision number for nitrogen , 1980 .

[22]  C. Mayoux,et al.  Experimental and theoretical study of a glow discharge at atmospheric pressure controlled by dielectric barrier , 1998 .

[23]  K. Hiraoka,et al.  Quantitative Aspects of Atmospheric-Pressure Penning Ionization , 2010 .

[24]  J. Cambronne,et al.  Electrical model of an atmospheric pressure Townsend-like discharge (APTD) , 2005 .

[25]  P. Bertrand,et al.  Poly(ethylene glycol) Films Deposited by Atmospheric Pressure Plasma Liquid Deposition and Atmospheric Pressure Plasma‐Enhanced Chemical Vapour Deposition: Process, Chemical Composition Analysis and Biocompatibility , 2010 .

[26]  P. Bruggeman,et al.  Corrigendum: Power dissipation, gas temperatures and electron densities of cold atmospheric pressure helium and argon RF plasma jets , 2011 .

[27]  A. Brablec,et al.  Experimental Study of Atmospheric Pressure Glow Discharge , 1998 .

[28]  D. Graves,et al.  Cold Atmospheric Plasma: Charged Species and Their Interactions With Cells and Tissues , 2008, IEEE Transactions on Plasma Science.

[29]  D. Pai,et al.  Transitions between corona, glow, and spark regimes of nanosecond repetitively pulsed discharges in air at atmospheric pressure , 2010 .

[30]  K. V. Kozlov,et al.  The barrier discharge: basic properties and applications to surface treatment , 2003 .

[31]  K. Schoenbach,et al.  Electron heating in atmospheric pressure glow discharges , 2001 .

[32]  Xiuling Zhang,et al.  Crystalline, Uniform‐Sized TiO2 Nanosphere Films by a Novel Plasma CVD Process at Atmospheric Pressure and Room Temperature , 2007 .

[33]  S. A. Starostin,et al.  Smooth and self-similar SiO2-like films on polymers synthesized in roll-to-roll atmospheric pressure-PECVD for gas diffusion barrier applications , 2010 .

[34]  Christophe Leys,et al.  Atmospheric pressure plasma jet in Ar and Ar/H2O mixtures: Optical emission spectroscopy and temperature measurements , 2010 .

[35]  K. Wiesemann,et al.  Classical absorption and emission spectroscopy of barrier discharges in /NO and mixtures , 1997 .

[36]  Thierry Belmonte,et al.  Nonequilibrium Atmospheric Plasma Deposition , 2011 .

[37]  Jaeyoung Park,et al.  The atmospheric-pressure plasma jet: a review and comparison to other plasma sources , 1998 .

[38]  M. Kogoma,et al.  Synthesis of plasma-polymerized tetraethoxysilane and hexamethyldisiloxane films prepared by atmospheric pressure glow discharge , 1995 .

[39]  A. Lunk,et al.  Deposition of fluorocarbon polymer films in a dielectric barrier discharge (DBD) , 2003 .

[40]  N. Gherardi,et al.  Physics and chemistry in a glow dielectric barrier discharge at atmospheric pressure: diagnostics and modelling , 2003 .

[41]  F. Arefi-Khonsari,et al.  Ar/HMDSO/O2 Fed Atmospheric Pressure DBDs: Thin Film Deposition and GC‐MS Investigation of By‐Products , 2010 .

[42]  Pascal Tristant,et al.  Atmospheric pressure plasmas: A review , 2006 .

[43]  R. D'agostino,et al.  Effect of Gas Impurities on the Operation of Dielectric Barrier Discharges Fed with He, Ar, and Ar‐C3F6 , 2011 .

[44]  Masuhiro Kogoma,et al.  Appearance of stable glow discharge in air, argon, oxygen and nitrogen at atmospheric pressure using a 50 Hz source , 1993 .

[45]  V. Buršíková,et al.  Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas , 2006 .

[46]  G. Yeom,et al.  Characteristics of SiO2-Like Thin Film Deposited by Atmospheric-Pressure PECVD Using HMDS ∕ O2 ∕ Ar , 2008 .

[47]  N. Gherardi,et al.  Glow and Townsend dielectric barrier discharge in various atmosphere , 2005 .

[48]  Jianjun Shi,et al.  Radio-frequency dielectric-barrier glow discharges in atmospheric argon , 2007 .

[49]  G. Yeom,et al.  Characteristics of SiOx thin films deposited by atmospheric pressure chemical vapor deposition as a function of HMDS/O2 flow rate , 2010 .

[50]  M.C.M. van de Sanden,et al.  High current diffuse dielectric barrier discharge in atmospheric pressure air for the deposition of thin silica-like films , 2010 .

[51]  N. Gherardi,et al.  Transition from glow silent discharge to micro-discharges in nitrogen gas , 2000 .

[52]  D. Ruch,et al.  Dispersion of Cerium‐Based Nanoparticles in an Organosilicon Plasma Polymerized Coating: Effect on Corrosion Protection , 2009 .

[53]  H. Terryn,et al.  Atmospheric Pressure Plasma Technology: a Straightforward Deposition of Antibacterial Coatings , 2011 .

[54]  Jean-Pascal Borra,et al.  Nucleation and aerosol processing in atmospheric pressure electrical discharges: powders production, coatings and filtration , 2006 .

[55]  N. Gherardi,et al.  Absolute nitrogen atom density measurements by two-photon laser-induced fluorescence spectroscopy in atmospheric pressure dielectric barrier discharges of pure nitrogen , 2009 .

[56]  P. Verboven,et al.  Exploration of Atmospheric Pressure Plasma Nanofilm Technology for Straightforward Bio-Active Coating Deposition: Enzymes, Plasmas and Polymers, an Elegant Synergy , 2011 .

[57]  P. Dubruel,et al.  Plasma‐Polymerization of HMDSO Using an Atmospheric Pressure Dielectric Barrier Discharge , 2009 .

[58]  K. Höpfner,et al.  Surface Functionalization at Atmospheric Pressure by DBD-Based Pulsed Plasma Polymerization , 2000 .

[59]  P. Dubruel,et al.  Deposition of HMDSO-based coatings on PET substrates using an atmospheric pressure dielectric barrier discharge , 2009 .

[60]  Thierry Belmonte,et al.  Nanoscience with non-equilibrium plasmas at atmospheric pressure , 2011 .

[61]  J. Behnke,et al.  Influence of interaction between charged particles and dielectric surface over a homogeneous barrier discharge in nitrogen , 2002 .

[62]  Davide Mariotti,et al.  Microplasmas for nanomaterials synthesis , 2010 .

[63]  C. Hibert,et al.  Rotational temperature measurements in atmospheric pulsed dielectric barrier discharge - gas temperature and molecular fraction effects , 2000 .

[64]  N. Gherardi,et al.  Recent advances in the understanding of homogeneous dielectric barrier discharges , 2009 .

[65]  D. Vangeneugden,et al.  Aerosol‐Assisted Plasma Deposition of Barrier Coatings using Organic‐Inorganic Sol‐Gel Precursor Systems , 2005 .

[66]  Y. Mori,et al.  Atmospheric pressure plasma chemical vapor deposition system for high-rate deposition of functional materials , 2000 .

[67]  Pascal Chabert,et al.  Physics of radio-frequency plasmas , 2011 .

[68]  Jianjun Shi,et al.  Mechanisms of the α and γ modes in radio-frequency atmospheric glow discharges , 2005 .

[69]  Xiwen Zhang,et al.  Microporous textured titanium dioxide films deposited at atmospheric pressure using dielectric barrier discharge assisted chemical vapor deposition , 2008 .

[70]  D. Roth,et al.  Atmospheric pressure plasma processing with microstructure electrodes and microplanar reactors , 2001 .

[71]  M. Tatoulian,et al.  Deposition of Organic Coatings at Atmospheric Pressure from Liquid Precursors , 2007 .

[72]  J. Badyal,et al.  Atmospheric pressure glow discharge deposition of polysiloxane and SiOx films , 2003 .

[73]  Françoise Massines,et al.  Atmospheric pressure PE-CVD of silicon based coatings using a glow dielectric barrier discharge , 2003 .

[74]  C. Klages,et al.  Plasma-enhanced chemical-vapour-deposition of thin films by corona discharge at atmospheric pressure , 1997 .

[75]  Gijbels,et al.  Modeling of metastable argon atoms in a direct-current glow discharge. , 1995, Physical review. A, Atomic, molecular, and optical physics.

[76]  R. D'agostino,et al.  Atmospheric Pressure PE-CVD of Fluorocarbon Thin Films by Means of Glow Dielectric Barrier Discharges , 2007 .

[77]  V. Hopfe,et al.  Atmospheric-Pressure PECVD Coating and Plasma Chemical Etching for Continuous Processing , 2007, IEEE Transactions on Plasma Science.

[78]  S. Verdier,et al.  Advantages of a Pulsed Electrical Excitation Mode on the Corrosion Performance of Organosilicon Thin Films Deposited on Aluminium Foil by Atmospheric Pressure Dielectric Barrier Discharge , 2009 .

[79]  Z. Rymuza,et al.  Thin Films Deposition from Hexamethyldisiloxane and Hexamethyldisilazane under Dielectric-Barrier Discharge (DBD) Conditions , 2000 .

[80]  S. A. Starostin,et al.  High Quality SiO2-like Layers by Large Area Atmospheric Pressure Plasma Enhanced CVD: Deposition Process Studies by Surface Analysis , 2009 .

[81]  P. Dubruel,et al.  Effect of electrode geometry on the uniformity of plasma-polymerized methyl methacrylate coatings , 2011 .

[82]  R. Brandenburg,et al.  The transition between different modes of barrier discharges at atmospheric pressure , 2009 .

[83]  L. O'Neill,et al.  Atmospheric Pressure Plasma Liquid Deposition – A Novel Route to Barrier Coatings , 2005 .

[84]  B. Twomey,et al.  Effect of Plasma Exposure on the Chemistry and Morphology of Aerosol‐Assisted, Plasma‐Deposited Coatings , 2008 .

[85]  Hubert Piquet,et al.  Synthesized High-Frequency Thyristor for Dielectric Barrier Discharge Excimer Lamps , 2012, IEEE Transactions on Industrial Electronics.

[86]  Christophe Leys,et al.  Application of atmospheric pressure dielectric barrier discharges in deposition, cleaning and activation. , 2001 .

[87]  S. Kanazawa,et al.  The improvement of the atmospheric-pressure glow plasma method and the deposition of organic films , 1990 .

[88]  D. Dowling,et al.  Investigation of the Effects of Gas versus Liquid Deposition in an Aerosol-Assisted Corona Deposition Process , 2010 .

[89]  B. Twomey,et al.  Correlation Between the Electrical and Optical Properties of an Atmospheric Pressure Plasma During Siloxane Coating Deposition , 2011 .

[90]  S. Uchida,et al.  Analysis of transient electron energy in a micro dielectric barrier discharge for a high performance plasma display panel , 2010 .

[91]  Jaeyoung Park,et al.  Discharge phenomena of an atmospheric pressure radio-frequency capacitive plasma source , 2001 .

[92]  P. Favia,et al.  Modulated rf discharges as an effective tool for selecting excited species , 1999 .

[93]  A. Fridman,et al.  Non-thermal atmospheric pressure discharges , 2005 .

[94]  Rashmi Singh,et al.  Novel approach to produce polymerized hydrocarbon coatings using dielectric barrier controlled atmospheric pressure glow discharge plasma , 2002 .

[95]  Ladislav Bardos,et al.  Cold atmospheric plasma: Sources, processes, and applications , 2010 .

[96]  N. Gherardi,et al.  Transport Phenomena in an Atmospheric-Pressure Townsend Discharge Fed by N2/N2O/HMDSO Mixtures , 2007 .

[97]  J. Jaroszyńska-Wolińska,et al.  Soft Plasma Polymerization of Gas State Precursors from an Atmospheric Pressure Corona Plasma Discharge , 2009 .

[98]  D. W. Sheel,et al.  Atmospheric Pressure Glow Discharge CVD of Al2O3 Thin Films , 2006 .

[99]  van de Mcm Richard Sanden,et al.  Atmospheric glow stabilization. Do we need pre-ionization? , 2005 .

[100]  J D Craggs,et al.  Spark channel formation , 1970 .

[101]  F. Reniers,et al.  Atmospheric plasmas for thin film deposition: A critical review , 2012 .

[102]  J. Benedikt,et al.  Surface reactions as carbon removal mechanism in deposition of silicon dioxide films at atmospheric pressure , 2011 .

[103]  U. Kogelschatz.  Dielectric-Barrier Discharges: Their History, Discharge Physics, and Industrial Applications , 2003 .

[104]  R. Brandenburg,et al.  Diffuse barrier discharges in nitrogen with small admixtures of oxygen: discharge mechanism and transition to the filamentary regime , 2005 .

[105]  J. Ginoux,et al.  Investigation of breakdown voltage curves for pure helium and silane–helium mixtures , 1994 .

[106]  F. Fanelli.  Thin film deposition and surface modification with atmospheric pressure dielectric barrier discharges , 2010 .

[107]  B. Lacour,et al.  Study of the treatment's homogeneity in plasma assisted chemical vapour deposition by atmospheric pressure dielectric barrier discharge , 2008 .

[108]  H. Koinuma,et al.  Deposition of ZnO film using an open-air cold plasma generator , 2006 .

[109]  Rafael Diez,et al.  Pulsed Current-Mode Supply of Dielectric Barrier Discharge Excilamps for the Control of the Radiated Ultraviolet Power , 2010, IEEE Transactions on Plasma Science.

[110]  R. Miles,et al.  Modeling of air plasma generation by repetitive high-voltage nanosecond pulses , 2002 .

[111]  Xiaohui Yuan,et al.  Computational study of capacitively coupled high-pressure glow discharges in helium , 2003 .

[112]  M.C.M. van de Sanden,et al.  On the formation mechanisms of the diffuse atmospheric pressure dielectric barrier discharge in CVD processes of thin silica-like films , 2009 .

[113]  N. Gherardi,et al.  Atmospheric pressure plasma deposition of thin films by Townsend dielectric barrier discharge , 2005 .

[114]  N. Gherardi,et al.  Influence of gas flow dynamics on discharge stability and on the uniformity of atmospheric pressure PECVD thin film , 2009 .

[115]  Kurt Becker,et al.  Microplasmas, an emerging field of low-temperature plasma science and technology , 2006 .

[116]  N. Gherardi,et al.  Anti-Fog Layer Deposition onto Polymer Materials: A Multi-Step Approach , 2011 .

[117]  K. V. Kozlov,et al.  Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure—A Comparison , 2001 .

[118]  Deposition of functional hydrogenated amorphous carbon-nitride film (a-CN:H) using C2H4/N2 townsend dielectric barrier discharge , 2009 .

[119]  A. Hotta,et al.  Gas barrier properties of carbon films synthesized by atmospheric pressure glow plasma , 2006 .

[120]  T. Wydeven,et al.  Plasma polymerization of ethylene in an atmospheric pressure-pulsed discharge , 1979 .

[121]  N. Gherardi,et al.  Conformity of Silica-like Thin Films Deposited by Atmospheric Pressure Townsend Discharge and Transport Mechanisms , 2009, IEEE Transactions on Plasma Science.

[122]  Hubert Piquet,et al.  Current-Mode Power Converter for Radiation Control in DBD Excimer Lamps , 2012, IEEE Transactions on Industrial Electronics.

[123]  R. D'agostino,et al.  Deposition of Hydrocarbon Films by Means of Helium‐Ethylene Fed Glow Dielectric Barrier Discharges , 2005 .

[124]  Jun Hee Lee,et al.  Deposition of carbon nanotubes by capillary-type atmospheric pressure PECVD , 2006 .

[125]  P. Bertrand,et al.  One Step Polymerization of Sulfonated Polystyrene Films in a Dielectric Barrier Discharge , 2010 .

[126]  N. Osawa,et al.  Generation of low-frequency homogeneous dielectric barrier discharge at atmospheric pressure , 2012, IEEE Transactions on Plasma Science.

[127]  J. Pacheco-Sotelo,et al.  A universal resonant converter for equilibrium and nonequilibrium plasma discharges , 2004, IEEE Transactions on Plasma Science.

[128]  Jan Čech,et al.  Deposition of thin organosilicon polymer films in atmospheric pressure glow discharge , 2004 .

[129]  P. Bruggeman,et al.  Is the rotational temperature of OH(A-X) for discharges in and in contact with liquids a good diagnostic for determining the gas temperature? , 2009 .

[130]  Robert D. Short,et al.  Deposition of functional coatings from acrylic acid and octamethylcyclotetrasiloxane onto steel using an atmospheric pressure dielectric barrier discharge , 2008 .

[131]  Mounir Laroussi,et al.  Arc-Free Atmospheric Pressure Cold Plasma Jets: A Review , 2007 .

[132]  Tianchun Ye,et al.  Deposition of SiOx films with a capacitively-coupled plasma at atmospheric pressure , 2007 .

[133]  J. Cambronne,et al.  Electrical model and analysis of the transition from an atmospheric pressure Townsend discharge to a filamentary discharge , 2005 .

[134]  Kunihito Tanaka,et al.  Deposition of Ethylene-Hexafluoropropene Gradient Plasma-Copolymer Using Dielectric Barrier Discharge Reactor at Atmospheric Pressure: Application to Release Coatings on Pressure-Sensitive Tape , 2003 .

[135]  A. Fridman,et al.  Nanosecond-Pulsed Uniform Dielectric-Barrier Discharge , 2008, IEEE Transactions on Plasma Science.

[136]  A. Lichtenberg,et al.  Principles of Plasma Discharges and Materials Processing: Lieberman/Plasma 2e , 2005 .

[137]  D. Dowling,et al.  A Comparison between Gas and Atomized Liquid Precursor States in the Deposition of Functional Coatings by Pin Corona Plasma , 2011 .

[138]  J. Badyal,et al.  Atmospheric Pressure Plasma Deposition of Structurally Well-Defined Polyacrylic Acid Films , 2003 .