Reliability of AlGaN-based deep UV LEDs on sapphire

Deep UV LEDs emitting at on 280 nm with powers as high as 1 mW at 20 mA have been reported recently. These devices have mesa size of 100 μm x 100 μm to avoid current crowding due to the high Al-composition of the AlxGa1-xN buffer layers. Small mesa size results in pump current density of 200 A/cm2 for a device current of 20 mA. Small area of p-contact also leads to higher operating voltage and higher thermal impedance for the flip-chip packaged device. These factors limit the device lifetime for 50 % power reduction to only a few hundred hours. From temperature and bias dependent power degradation measurements we found the output power to decay with two characteristic time constants indicating two degradation mechanisms. The faster time constant is bias dependent and temperature independent. The slower time constant varies exponentially with junction temperature having the activation energy of 0.27 eV at 200 A/cm2 pump current density. For the devices with high thermal impedance this degradation mechanism controls the long term power degradation. To increase the device area for better reliability we used the interconnected micro-pixel device design with 10x10 array of 22 μm in diameter pixels. This design allowed for the four-fold increase of the junction area and thereby led to improved reliability performance with the operation life-time for 50 % power reduction of about 1000 hours. In this paper we will present the details of the reliability measurements and use the experimental results to determine possible degradation mechanisms.

[1]  J. Kretchmer,et al.  Diffusion and tunneling currents in GaN/InGaN multiple quantum well light-emitting diodes , 2002, IEEE Electron Device Letters.

[2]  Grigory Simin,et al.  High-power deep ultraviolet light-emitting diodes basedon a micro-pixel design , 2004 .

[3]  Mathew C. Schmidt,et al.  Milliwatt Power Deep Ultraviolet Light Emitting Diodes Grown on Silicon Carbide , 2005 .

[4]  Toshio Nishida,et al.  AlGaN-based ultraviolet light-emitting diodes grown on bulk AlN substrates , 2004 .

[5]  M. Asif Khan,et al.  High DC power 325 nm emission deep UV LEDs over sapphire [AlGaN] , 2002 .

[6]  M. Asif Khan,et al.  III–Nitride UV Devices , 2005 .

[7]  Zhaoyang Fan,et al.  Nitride deep-ultraviolet light-emitting diodes with microlens array , 2005 .

[8]  Grigory Simin,et al.  Milliwatt power deep ultraviolet light-emitting diodes over sapphire with emission at 278 nm , 2002 .

[9]  M. Shatalov,et al.  High-quality AlGaN layers over pulsed atomic-layer epitaxially grown AlN templates for deep ultraviolet light-emitting diodes , 2003 .

[10]  V. Adivarahan,et al.  Sub-Milliwatt Power III-N Light Emitting Diodes at 285 nm , 2002 .

[11]  M. Asif Khan,et al.  AlN/AlGaN superlattices as dislocation filter for low-threading-dislocation thick AlGaN layers on sapphire , 2002 .

[12]  P. A. Morton,et al.  Impedance‐corrected carrier lifetime measurements in semiconductor lasers , 1995 .

[13]  Mim Lal Nakarmi,et al.  AlGaN-based ultraviolet light-emitting diodes grown on AlN epilayers , 2004 .

[14]  Robert Kaplar,et al.  Room-temperature direct current operation of 290 nm light-emitting diodes with milliwatt power levels , 2004 .

[15]  Hong Wang,et al.  Pulsed atomic-layer epitaxy of ultrahigh-quality AlxGa1−xN structures for deep ultraviolet emissions below 230 nm , 2002 .

[16]  M. Asif Khan,et al.  Continuous Wave Milliwatt Power AlGaN Light Emitting Diodes at 280 nm , 2004 .

[17]  M. Asif Khan,et al.  Micro-pixel Design Milliwatt Power 254 nm Emission Light Emitting Diodes , 2004 .

[18]  M. Khan,et al.  Fine structure of AlN∕AlGaN superlattice grown by pulsed atomic-layer epitaxy for dislocation filtering , 2005 .

[19]  G. Simin,et al.  Differential Carrier Lifetime in AlGaN Based Multiple Quantum Well Deep UV Light Emitting Diodes at 325 nm : Semiconductors , 2002 .

[20]  Ignacio Mártil,et al.  Influence of defects on the electrical and optical characteristics of blue light-emitting diodes based on III–V nitrides , 1997 .

[21]  Hong Wang,et al.  Crack-free thick AlGaN grown on sapphire using AlN/AlGaN superlattices for strain management , 2002 .

[22]  S. Goto,et al.  Dislocation related issues in the degradation of GaN-based laser diodes , 2004, IEEE Journal of Selected Topics in Quantum Electronics.

[23]  Michael S. Shur,et al.  Milliwatt power AlGaN quantum well deep ultraviolet light emitting diodes , 2003 .

[24]  Manijeh Razeghi,et al.  4.5 mW operation of AlGaN-based 267 nm deep-ultraviolet light-emitting diodes , 2003 .